WP3 Extension of POI substrate performance

Objectives: POI wafers enabling IL near 0.5 dB, quality factor > 4000 @ 2 GHz, preserving other POI features, i.e., low temperature drift of the mode, guiding, heat dispersion, rad-hardness etc. To reach this target, the objectives of WP3 are the following:

• Analyses of the current POI substrate and its limitation
• Development of test vehicle and methodology
• Development of alternative handling substrates to overperform current one
• Extensive characterization of different POI substrates in large frequency and temperature ranges, its immunity to radiation and capacity to handle high power and heat evacuation
• Benchmarking and transfer to industry

WP Leader : UCL